Ion Beam Modification and Analysis of Materials
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More detailed information about Ion Beam Modification and Analysis of Materials.
The activity of the group is devoted to research and development of ion beam equipment and applications such as ion beam modification of materials and ion beam analyses, and some associated problems. The group cooperates with other laboratories within the Faculty and elsewhere, and works in the field of environmental studies, archeology, mycology, research and development of new materials.
The main equipment of the Ion Beam Laboratory consists of:
- Medium energy (100 keV) experimental ion beam equipment with a
versatile heavy ion source and mass separated ion beam. It is used
for ion beam modification of materials.
- An equipment with proton and He-ion beam from 2.5 MV Van de
Graaff accelerator, devoted mainly to ion beam analyses. It has two
target chambers, an experimental one for ion scattering measurements
and another for PIXE, RBS and PESA analysis. Two-dimensional mapping
of elemental composition by PIXE sub-millimetre proton probe is
possible in a modified target chamber. PIXE analysis is performed
either in high vacuum or in an atmosphere (N
, He) with external
beam. Liquid sample analysis is possible. Another modification of
the target chamber allows high energy light ion implantation, also
at liquid nitrogen temperature.
Projects supported by grants
The group participates in three research plans of Ministry of Education:
- M©M 210000019 - Applications of radionuclides and ionizing
radiation.
PIXE analyses of environmental samples, samples for archeological studies, and mycology.
- M©M 210000021 - Characterisation of Materials.
Ion beam analyses of thin surface layers, mainly by ion scattering spectrometry, with PIXE as a complementary method.
- M©M 210000022 - Laser systems and their applications.
Ion beam modification of surface layer of optical material, preparation of planar waveguide structures by ion implantation.
List of Selected Publications and Conference Contributions
- Hrubá, I. - Král, J.: Modification of LiNbO
Optical
Properties by He
Implantation. In: Optical Inorganic Dielectric
Materials and Devices, A. Krumins, D.K. Millers, A. Sternberg, and
J. Spigulis, Editors, Proc. SPIE 2967 (1997) p. 180-185.[]
- Hříbek, P. - Král, J. - Folttiny, F.: Ion-Implanted Planar
Waveguide Laser Structures.In: Workshop 98. Prague: CTU, 1998, p.
61-62.
- Nejedlý, Z. - Král, J. - Voltr, J. - Krejčí, R. - Swietlicki, E.
- Černý, J. - Kubík, P. - ©vejda, J.: Quality Assurance of
Environmental PIXE Analysis in Prague. In: Nuclear Intruments and
Methods in Physics Research. 1998, vol. B 136/138, p. 981-985. ISSN
0168-583X.
- Nejedlý, Z.:PIXE analysis of environmental samples, Doctoral
Theses, FNSPE CTU in Prague, Prague, 1998.
- Key, P. - Král, J. - Schmidt, M.: Ion Beam Analysis of Pulsed
Laser Deposited Ti:Sapphire. In: Applied Surface Science. 1999, vol.
138-139, p. 503-506. ISSN 0169-4332.
- Voltr, J. - Král, J. - Nejedlý, Z.: PESA as a Complementary Tool
to PIXE at CTU Prague. In: Nuclear Instruments and Methods in
Physics Research. 1999, vol. B 150, p. 554-558. ISSN 0168-583X.
- Voltr, J. - Král, J. - Nejedlý, Z. - ©imčík, S.: Sub-milliprobe at the CTU in Prague. In: Nuclear Instruments and Methods in Physics Research. 2000, vol. B 161-163, p. 344-347. ISSN 0168-583X.